COMPACT SUBSTRATE HEATER FOR USE IN AN OXIDIZING ATMOSPHERE

被引：10

作者：

JONES, TE

MCGINNIS, WC

BRIGGS, JS

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1994年 / 65卷 / 04期

关键词：

D O I：

10.1063/1.1144930

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A compact heater, designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or in vacuum, is described. The heater, including an oxygen-resistant case and the attached substrate, can be loaded into a vacuum deposition chamber through a small-diameter load-lock port, and will operate in 0-1 atm of oxygen at temperatures up to at least 800-degrees-C. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was built specifically to heat substrates during the growth of high-temperature superconducting thin films.

引用

页码：977 / 980

页数：4

共 12 条

[1]

Dhere N. G., 1992, PHYS THIN FILMS, V16, P1

[2]

Geerk J., 1989, Material Science Reports, V4, P193, DOI 10.1016/S0920-2307(89)80003-9

[3]

GLANG R, 1970, HDB THIN FILM TECHNO, P72

[4] INEXPENSIVE RADIANT SUBSTRATE HEATER FOR VACUUM USE [J].