A New Contact Conductance Measurement Technique for Metal-HTSC Film Contact

被引：5

作者：

Apte, Prakash R. ^{[1
]}

Kumar, Dhananjay ^{[2
]}

Pinto, Richard ^{[1
]}

Sharon, Maheshwar ^{[2
]}

Gupta, L. C. ^{[1
]}

Vijayaraghavan, R. ^{[1
]}

机构：

[1] Tata Inst Fundamental Res, Bombay 400005, Maharashtra, India

[2] Indian Inst Technol, Dept Chem, Bombay 400076, Maharashtra, India

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1992年 / 2卷 / 03期

关键词：

708.3 Superconducting Materials - 714 Electronic Components and Tubes - 921 Mathematics;

D O I：

10.1109/77.160157

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new 4-point contact conductance measurement technique has been developed for measuring the contact conductance of the metal-HTSC film interface. A distributed "RG" model predicts a small nonzero (residual) resistance from which the contact conductance is determined. The measurement technique is described along with first results.

引用

页码：176 / 180

页数：5

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