ELASTIC DISTORTIONS OF STRAINED LAYERS GROWN EPITAXIALLY IN ARBITRARY DIRECTIONS

被引:18
作者
ANASTASSAKIS, E
机构
[1] National Technical University, Physics Department, Athens, 157 73, Zografou Campus
关键词
Elasticity - Films--Strain - Mathematical Techniques--Matrix Algebra - X-Rays--Diffraction;
D O I
10.1016/0022-0248(91)90411-W
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We consider the elastic distortions which are due to lattice mismatch between epitaxial layers and substrates. The growth is assumed to take place in an arbitrary crystallographic direction. Explicit forms are obtained for the deformation of the unit cell and its two components, i.e., the angular distortion (symmetric strain) and the rigid-body rotation (antisymmetric strain). The correction factors which connect the relaxed lattice constants of the layer with observables from X-ray diffractometry are obtained in analytical forms. As shown through specific applications, the results agree with those obtained numerically in the literature.
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页码:647 / 655
页数:9
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