EFFECT OF DEPOSITION RATE ON BASIC PROPERTIES OF THIN CDSE FILMS

被引:21
作者
KUBOVY, A
HAMERSKY, J
SYMERSKY, B
机构
[1] Research Institute of Electroceramics, Hradec Králové
关键词
D O I
10.1016/0040-6090(69)90018-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The specific resistance, adhesion and stress of CdSe films evaporated on glass and mica substrates at room temperature are discussed in relation to the deposition rate of the films in the range from 0.2 to 700 Å/s. The experimental results show that the structure and chemical composition of the film are strongly dependent upon the deposition rate. At low rates of deposition CdSe films with amorphous structure appear, probably due to the influence of sorbed gases from the residual atmosphere. For the medium rates the crystallite size of CdSe films increases. At high rates, the films consist of a Cd-Se phase, which is formed by amorphous Se and dispersed Cd. Locating these regions relative to deposition rate depends on the substrate material. © 1969.
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页码:35 / &
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