A SIMS STUDY OF NICKEL DEPOSITION ON TIO2(100) - INFLUENCE OF THE STOICHIOMETRY OF THE SUPPORT

被引：15

作者：

BOURGEOIS, S

JOMARD, F

PERDEREAU, M

机构：

[1] Faculté des Sciences Mirande, Laboratoire de Recherches sur la Réactivité des Solides, 21004 Dijon Cedex

来源：

SURFACE SCIENCE | 1991年 / 249卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(91)90844-I

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Nickel deposition on a clean TiO2(100) surface was studied mainly by secondary ion mass spectrometry (SIMS). Different kinds of supports exhibiting a more or less high deviation from stoichiometry were used. For a quasi-stoichiometric support a layer-by-layer growth of 2 or 3 nickel layers is obtained followed by a nucleation stage. For a non-stoichiometric support nickel is found to diffuse into the bulk TiO2 even at room temperature. The influence of temperature on this diffusion was also studied.

引用

页码：194 / 198

页数：5

共 15 条

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