THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS CR-NB AND CR-TA ALLOYS IN 12-M HCI SOLUTION

被引：43

作者：

KIM, JH

AKIYAMA, E

HABAZAKI, H

KAWASHIMA, A

ASAMI, K

HASHIMOTO, K

机构：

[1] Institute for Materials Research, Tohoku University, Sendai

来源：

CORROSION SCIENCE | 1993年 / 34卷 / 12期

关键词：

D O I：

10.1016/0010-938X(93)90052-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Binary Cr-Nb and Cr-Ta alloys containing 29-63 at% niobium and 26-69 at% tantalum, respectively, with a single phase amorphous structure, were formed by a sputtering method. Corrosion rates of amorphous Cr-Nb alloys were about four orders of magnitude lower than that of chromium metal and about one fifth of that of niobium metal in 12 M HCl solution. Corrosion rates of amorphous Cr-Ta alloys were lower than that of tantalum metal and were not detected even after about 1 week immersion in 12 M HCl solution. The Cr-Nb and Cr-Ta alloys were spontaneously passive in 12 M HCl solution, in spite of the fact that chromium dissolved actively in 12 M HCl solution.

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页码：1947 / 1955

页数：9

相关论文

共 12 条

[1] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS COPPER NIOBIUM ALLOYS IN 12 N-HCL [J].

HIROTA, E ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1991, 32 (11) :1213-1225

[2] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS TITANIUM CHROMIUM-ALLOYS IN 1-M AND 6-M HCL SOLUTIONS [J].

KIM, JH ;

AKIYAMA, E ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1993, 34 (06) :975-987

[3] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS CHROMIUM ZIRCONIUM ALLOYS IN 6 M HCL SOLUTION [J].

KIM, JH ;

AKIYAMA, E ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1993, 34 (11) :1817-1827

[4] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS COPPER TANTALUM ALLOYS IN 12-M HCL [J].

KIM, JH ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1992, 33 (10) :1507-1518

[5]

SHIMAMURA K, 1988, P S CORROSION ELECTR, P232

[6] PASSIVITY AND ITS BREAKDOWN ON SPUTTER-DEPOSITED AMORPHOUS AL-TI ALLOYS IN A NEUTRAL AQUEOUS-SOLUTION WITH CL- [J].

YAN, Q ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1990, 31 :401-406

[7] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AL-TI ALLOYS IN 1-N HCL [J].

YAN, Q ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1991, 32 (03) :327-335

[8] THE PITTING CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AMORPHOUS AL-TI ALLOYS IN A NEUTRAL CHLORIDE-CONTAINING SOLUTION [J].

YAN, Q ;

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1990, 125 (1-2) :25-31

[9] THE CORROSION BEHAVIOR OF SPUTTER-DEPOSITED AL-ZR ALLOYS IN 1-M HCL SOLUTION [J].

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1992, 33 (03) :425-436

[10] ANODIC POLARIZATION BEHAVIOR OF SPUTTER-DEPOSITED AL-ZR ALLOYS IN A NEUTRAL CHLORIDE-CONTAINING BUFFER SOLUTION [J].

YOSHIOKA, H ;

HABAZAKI, H ;

KAWASHIMA, A ;

ASAMI, K ;

HASHIMOTO, K .

ELECTROCHIMICA ACTA, 1991, 36 (07) :1227-1233