DETERMINATION OF ARGON IN SPUTTERED SILICON FILMS BY ENERGY-DISPERSIVE X-RAY-FLUORESCENCE SPECTROMETRY

被引：4

作者：

KALNICKY, DJ ^{[1
]}

MOUSTAKAS, TD ^{[1
]}

机构：

[1] EXXON RES & ENGN CO,LINDEN,NJ 07036

来源：

ANALYTICAL CHEMISTRY | 1981年 / 53卷 / 12期

关键词：

D O I：

10.1021/ac00235a017

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

收藏

页码：1792 / 1795

页数：4

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