DEPLETION LAYER CALCULATIONS FOR ERROR FUNCTION DIFFUSED JUNCTIONS

被引:11
作者
WILSON, PR
机构
[1] A.E.I. Semiconductors Ltd., Lincoln, England, Carholme Road
关键词
D O I
10.1016/0038-1101(69)90009-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Expressions are derived for the voltage dependance of the depletion layer width, the maximum electric field and the capacitance of error function diffused plane cylindrical and spherical p-n junctions. These are also shown in graphical form for junctions in silicon for ratios of surface to background concentration covering the range 102-107. It is shown that the junctions can be considered to be either linearly graded or abrupt with a transition range covering about 2 decades of voltage. The results obtained are very similar to those for gaussian diffused junctions. © 1969.
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页码:277 / &
相关论文
共 3 条
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KENNEDY, DP ;
OBRIEN, RR .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1965, 9 (03) :179-&
[2]   DIFFUSED JUNCTION DEPLETION LAYER CALCULATIONS [J].
LAWRENCE, H ;
WARNER, RM .
BELL SYSTEM TECHNICAL JOURNAL, 1960, 39 (02) :389-403
[3]   DEPLETION LAYER AND CAPACITANCE CALCULATIONS FOR GAUSSIAN DIFFUSED JUNCTIONS [J].
WILSON, PR .
SOLID-STATE ELECTRONICS, 1969, 12 (01) :1-&