INHOMOGENEITY OF AMORPHOUS-SILICON THIN-FILMS FROM OPTICAL-TRANSMISSION AND REFLECTION MEASUREMENTS

被引：28

作者：

PISARKIEWICZ, T ^{[1
]}

STAPINSKI, T ^{[1
]}

CZTERNASTEK, H ^{[1
]}

RAVA, P ^{[1
]}

机构：

[1] ELETTRORAVA SPA,I-10040 SAVONERA,ITALY

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷

关键词：

D O I：

10.1016/S0022-3093(05)80194-2

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In order to evaluate inhomogeneity of amorphous silicon thin films in the direction normal to the film surface, a calculation procedure was adopted enabling determination of the optical constants of films with a slightly rough upper surface and with an assumed variation of refractive index. Calculations were based on measured transmittance and reflectance at normal incidence in the region of interference fringes.

引用

页码：619 / 622

页数：4

共 16 条

[1]

[Anonymous], 1976, OPTICS THIN FILMS OP

[2]

BENNET HE, 1967, PHYSICS THIN FILMS, V4

[3]

CODY GD, 1984, SEMICONDUCT SEMIMET, V21, P11

[4]

CZAPLA A, 1988, ELEKTROTECHNIKA, V7, P313