SIMS AND DLTS MEASUREMENTS ON FE-DOPED INP EPITAXIAL LAYERS GROWN BY MOCVD

被引:12
作者
TAKANOHASHI, T [1 ]
NAKAI, K [1 ]
NAKAJIMA, K [1 ]
机构
[1] FUJITSU LABS LTD,ATSUGI 24301,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1988年 / 27卷 / 01期
关键词
D O I
10.1143/JJAP.27.L113
中图分类号
O59 [应用物理学];
学科分类号
摘要
10
引用
收藏
页码:L113 / L115
页数:3
相关论文
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