PRECIPITATION IN FE-DOPED SEMI-INSULATING INP EPITAXIAL LAYER GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)

被引:17
作者
CHU, SNG
NAKAHARA, S
LONG, JA
RIGGS, VG
JOHNSTON, WD
机构
[1] AT&T Bell Lab, Murray Hill, NJ,, USA, AT&T Bell Lab, Murray Hill, NJ, USA
关键词
IRON AND ALLOYS;
D O I
10.1149/1.2113667
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The authors report the observation of small coherent precipitates in Fe-doped semi-insulating InP epitaxial layer grown by MOCVD on S-doped (001) InP substrate. Within the iron concentration range of 3 multiplied by 10**1**7 to 2 multiplied by 10**1**9 cm** minus **3, the density of precipitate increases with increasing iron concentration, while the size of precipitates (100-250A) remains more or less constant. These are identified as FeP. Due to the differences in lattice structures, precipitation of FeP instead of FeP//2 observed in bulk crystal can be rationalized in terms of the minimization of the misfit strain energy. Occasionally, slip-type dislocation structures were observed associated with the precipitates.
引用
收藏
页码:2795 / 2798
页数:4
相关论文
共 14 条
  • [1] VAPOR GROWTH OF INP FOR MESFETS
    CHEVRIER, J
    ARMAND, M
    HUBER, AM
    LINH, NT
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1980, 9 (04) : 745 - 761
  • [2] CHU SNG, 1984, J ELECTROCHEM SOC, V131, P2663, DOI 10.1149/1.2115378
  • [3] GALLIUM CONTAMINATION OF INP EPITAXIAL LAYERS IN INP/INGAASP MULTILAYER STRUCTURES GROWN BY HYDRIDE TRANSPORT VAPOR-PHASE EPITAXY
    CHU, SNG
    STEVIE, FA
    MACRANDER, AT
    KARLICEK, RF
    CHANG, CC
    JODLAUK, CM
    STREGE, KE
    MITCHAM, DL
    JOHNSTON, WD
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (05) : 1187 - 1193
  • [4] KUBOTA E, 1982, I PHYS C SER, V63, P31
  • [5] LEE RN, 1977, MATER RES BULL, V12, P651, DOI 10.1016/0025-5408(77)90075-7
  • [6] GROWTH OF FE-DOPED SEMI-INSULATING INP BY MOCVD
    LONG, JA
    RIGGS, VG
    JOHNSTON, WD
    [J]. JOURNAL OF CRYSTAL GROWTH, 1984, 69 (01) : 10 - 14
  • [7] EUTECTIC PRECIPITATES IN FE-DOPED INP
    MIYAZAWA, S
    KOIZUMI, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (10) : 2335 - 2338
  • [8] SEMI-INSULATING PROPERTIES OF FE-DOPED INP
    MIZUNO, O
    WATANABE, H
    [J]. ELECTRONICS LETTERS, 1975, 11 (05) : 118 - 119
  • [9] MORIOKA M, 1982, I PHYS C SER, V63, P37
  • [10] NAKAHARA S, UNPUB J CRYST GROWTH