EXCIMER FORMATION IN ARGON, KRYPTON, AND XENON DISCHARGE AFTERGLOWS BETWEEN 200-K AND 400-K

被引：51

作者：

WIEME, W

LENAERTS, J

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1981年 / 74卷 / 01期

关键词：

D O I：

10.1063/1.440855

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：483 / 493

页数：11

共 67 条

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