SIC MEMBRANES FOR X-RAY MASKS PRODUCED BY LASER ABLATION DEPOSITION

被引：22

作者：

BOILY, S

CHAKER, M

PEPIN, H

KERDJA, T

VOYER, J

JEAN, A

KIEFFER, JC

LEUNG, P

CERRINA, F

WELLS, G

机构：

[1] NO TELECOM ELECT LTD,OTTAWA K1Y 4H7,ONTARIO,CANADA

[2] UNIV WISCONSIN MADISON,CTR X-RAY LITHOG,STOUGHTON,WI 53589

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585298

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Laser ablation deposition is used for the first time to fabricate SiC membranes for x-ray lithography. The process has the unique advantage of producing in a very simple manner purely stoichiometric (1:1) SiC films free of hydrogen. The variation of deposition rate with laser energy and intensity, the uniformity and quality of the films produced as well as an estimate of the energy of the neutrals and of the ions involved in the deposition are presented. SiC membranes of 1 in. diam have been successfully fabricated after anisotropic etching of the silicon substrate in a KOH solution. They present an optical transparency of 40% at 633 nm.

引用

收藏

页码：3254 / 3257

页数：4

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