EFFECT OF BAF2 ON THE NITRIDATION OF COMMERCIAL SILICON

被引：5

作者：

BISWAS, SK

MUKERJI, J

机构：

来源：

关键词：

D O I：

10.1111/j.1151-2916.1980.tb10704.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：232 / 233

页数：2

共 12 条

[1]

ATKINSON A, 1973, P BRIT CERAM SOC JUN, P253

[2] MECHANISM FOR NITRIDATION OF FE-CONTAMINATED SILICON [J].

BOYER, SM ;

MOULSON, AJ .

[3]

DOREMUS RH, 1962, MOD ASPECT VITR, V2, P1

[4]

GLASSTONE S, 1941, THEORY RATE PROCESSE, P370

[5]

HUETTINGER KJ, 1970, HIGH TEMP HIGH PRESS, V2, P89

[6]

KIJIMA K, 1976, J CHEM PHYS, V65, P2668, DOI 10.1063/1.433464

[7] KINETICS OF NITRIDATION OF SI POWDER COMPACTS [J].

MESSIER, DR ;

WONG, P .

[8] REACTION-BONDED SILICON-NITRIDE - ITS FORMATION AND PROPERTIES [J].

MOULSON, AJ .

[9]

MUKERJI J, 1978, INDIAN J TECHNOL, V16, P156

[10]

MUKERJI J, 1972, HIGH TEMPERATURE MAT, P249