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ON DISLOCATION LOSS IN THIN FILM ELECTRON MICROSCOPY OF POLYCRYSTALLINE COPPER

被引：5
作者：
FOXON, CTB
RIDER, JG
机构：
来源：
PHILOSOPHICAL MAGAZINE | 1968年 / 17卷 / 148期
关键词：
D O I：
10.1080/14786436808223025
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：729 / &
相关论文
共 6 条
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[2]   DISLOCATION REARRANGEMENT IN FATIGUE-HARDENED ALUMINIUM DURING PREPARATION FOR TRANSMISSION ELECTRON MICROSCOPY [J].
GROSSKREUTZ, JC ;
SHAW, GG .
PHILOSOPHICAL MAGAZINE, 1964, 10 (108) :961-&
[3]  
HAM RK, 1961, PHILOS MAG, V6, P1193, DOI 10.1080/14786436108239683
[4]   ON LOSS OF DISLOCATIONS DURING PREPARATION OF A THIN FILM [J].
HAM, RK .
PHILOSOPHICAL MAGAZINE, 1962, 7 (79) :1177-&
[5]  
HARGREAVES ME, 1963, C RELATION BETWEEN S, P209
[6]   AN EXPERIMENTAL DETERMINATION OF ELECTRICAL RESISTIVITY OF DISLOCATIONS IN ALUMINIUM [J].
RIDER, JG ;
FOXON, CTB .
PHILOSOPHICAL MAGAZINE, 1966, 13 (122) :289-&
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