DESIGN OF MULTIPLE LAYERED A-SI-H(F)/A-SIGEX-H(F) FILMS FOR ENHANCEMENT IN PHOTORESPONSE IN THE NEAR-INFRARED SPECTRUM

被引：12

作者：

SHIRAI, H

TANABE, A

ODA, S

HANNA, J

NAKAMURA, T

SHIMIZU, I

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 41卷 / 04期

关键词：

D O I：

10.1007/BF00616047

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：259 / 265

页数：7

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