MOCVD OF HIGH-T-C SUPERCONDUCTING MATERIALS

被引：30

作者：

DAHMEN, KH ^{[1
]}

GERFIN, T ^{[1
]}

机构：

[1] ECOLE POLYTECH FED,INST CHIM PHYS,CH-1015 LAUSANNE,SWITZERLAND

来源：

PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS | 1993年 / 27卷 / 02期

关键词：

MOCVD; THIN FILMS; SUPERCONDUCTORS; PRECURSORS; SUBSTRATES; BUFFER LAYERS;

D O I：

10.1016/0960-8974(93)90001-K

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

This present review gives a short overview of new developments of techniques and precursors for metalorganic chemical vapor deposition (MOCVD) in the field of high T-c superconducting (HTS) materials. Especially, the search for new precursors will be discussed in detail. The substrates and buffer layer systems, which have been used for HTS materials will be presented with respect to observed properties of the films. Finally, the physical properties and possible applications will be discussed briefly.

引用

页码：117 / 161

页数：45

共 179 条

[1] ABE H, 1990, ADV SUPERCOND, V2, P761
[2] ADRIAN FJ, 1992, CHEM ENG NEWS, V21, P24
[3] A VOLATILE THALLIUM CHELATE, (2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)TL(I)
AMANO, R
SHIOKAWA, Y
[J]. INORGANICA CHIMICA ACTA, 1993, 203 (01) : 9 - 10
[4] HIGH JC Y-BA-CU-O THIN-FILM ON METAL SUBSTRATES PREPARED BY CHEMICAL VAPOR-DEPOSITION
AOKI, S
YAMAGUCHI, T
IIJIMA, Y
KAGAWA, A
KOHNO, O
NAGAYA, S
INOUE, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (5A): : L547 - L549
[5] AOKI S, 1990, ADV SUPERCONDUCTIVIT, V2, P1105
[6] AOKI S, 1992, APPL SUPERCONDUCTIVI
[7] AOKI S, 1990, ADV SUPERCONDUCTIVIT, V2, P439
[8] ATWOOD MP, 1992, IN PRESS ELECTRONIC
[9] DIMENSIONAL CROSSOVER EFFECT IN J(C) CHARACTERISTICS OF CHEMICAL VAPOR-DEPOSITION PROCESSED YBA2CU3O7-DELTA FILMS
AWAJI, S
WATANABE, K
KOBAYASHI, N
YAMANE, H
HIRAI, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (11A): : L1532 - L1535
[10] DEPOSITION OF OXIDE-FILMS BY METAL-ORGANIC MOLECULAR-BEAM EPITAXY
BADE, JP
BAKER, EA
KINGON, AI
DAVIS, RF
BACHMANN, KJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (02): : 327 - 331

← 1 2 3 4 5 6 7 8 9 10 →