STRUCTURAL AND ELECTRICAL PROPERTIES OF EVAPORATED CR-NI FILMS AS A FUNCTION OF GAS PRESSURE

被引：45

作者：

LASSAK, L

HIEBER, K

机构：

[1] SIEMENS AG,UNTERNEHMENSBEREICH BAUELEMENTE,BALANSTR 73,8 MUNCHEN 80,WEST GERMANY

[2] SIEMENS AG,FORSCH LAB,BALANSTR 73,8 MUNCHEN 80,WEST GERMANY

来源：

THIN SOLID FILMS | 1973年 / 17卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90010-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：105 / 111

页数：7

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