EPITAXY AND ORIENTATION OF EU1BA2CU3O7-Y FILMS GROWN INSITU BY MAGNETRON SPUTTERING

被引：58

作者：

ASANO, H

ASAHI, M

MICHIKAMI, O

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 06期

关键词：

D O I：

10.1143/JJAP.28.L981

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L981 / L983

页数：3

共 22 条

[1]

CHAN CH, 1988, APPL PHYS LETT, V53, P2339

[2] REACTIVE MAGNETRON SPUTTERING OF THIN-FILM SUPERCONDUCTOR YBA2CU3O7-CHI [J].

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[3] CRITICAL-CURRENT MEASUREMENTS IN EPITAXIAL-FILMS OF YBA2CU3O7-X COMPOUND [J].

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[5]

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[7] AS-DEPOSITED HIGH-TC AND JC SUPERCONDUCTING THIN-FILMS MADE AT LOW-TEMPERATURES [J].

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[8] HIGH-TC YB-BA-CU-O THIN-FILMS DEPOSITED ON SINTERED YSZ SUBSTRATES BY SPUTTERING [J].

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NAGATA, S ;

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (05) :L738-L740

[9] STRUCTURAL AND SUPERCONDUCTING PROPERTIES OF ORIENTATION-ORDERED Y1BA2CU3O7-X FILMS PREPARED BY MOLECULAR-BEAM EPITAXY [J].

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[10] PRODUCTION OF YBA2CU3O7-Y SUPERCONDUCTING THIN-FILMS INSITU BY HIGH-PRESSURE REACTIVE EVAPORATION AND RAPID THERMAL ANNEALING [J].

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BUHRMAN, RA .

APPLIED PHYSICS LETTERS, 1987, 51 (19) :1554-1556

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