EPITAXIAL THIN-FILMS OF ZNS AND GAAS PREPARED BY RF SPUTTERING ON NACL SUBSTRATES

被引：16

作者：

BUNTON, GV

DAY, SCM

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(72)90267-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：11 / &

共 14 条

[1]

AGGARWAL PS, 1963, INDIAN J PURE APPL P, V1, P366

[2]

ANTELL GR, 1962, COMPOUND SEMICONDUCT, V1, P288

[3] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J].

DAVIDSE, PD ;

MAISSEL, LI .

[4] THEORY AND PRACTICE OF RF SPUTTERING [J].

DAVIDSE, PD .

EVANS, T ;

NOREIKA, AJ .

PHILOSOPHICAL MAGAZINE, 1966, 13 (124) :717-&

[6]

HOLLAND L, 1956, VACUUM DEPOSITION TH

[7]

JOYCE BA, 1968, J CRYSTAL GROWTH, V4, P43

[8]

MCDOWELL RB, 1969, SOLID STATE TECHNOL, V8, P23

[9]

ONeal J.E., 1968, J CRYST GROWTH, V2, P80

[10]

PUTNER T, 1967, THIN SOLID FILMS, V1, P165