INTERFACE ANALYSIS OF PLASMA-DEPOSITED TITANIUM NITRIDE ON STAINLESS-STEELS

被引：7

作者：

GRONING, P ^{[1
]}

NOWAK, S ^{[1
]}

SCHLAPBACH, L ^{[1
]}

HINTERMANN, HE ^{[1
]}

机构：

[1] SWISS CTR ELECTR & MICROTECHNOL INC,CH-2007 NEUCHATEL,SWITZERLAND

来源：

APPLIED SURFACE SCIENCE | 1992年 / 62卷 / 04期

关键词：

D O I：

10.1016/0169-4332(92)90361-Z

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ultra-thin titanium nitride (TiN) films of about 30 angstrom, thickness were deposited by means of an electron cyclotron resonance (ECR) plasma using a plasma-sputtering process in nitrogen at 25 and 600-degrees-C substrate temperatures. Using X-ray photoelectron spectroscopy (XPS) we have investigated the chemical composition of the formed TiN/steel interface. The effects of substrate temperature during and after deposition and the influence of the plasma, on the interface are reported. At the interface the plasma is found to result in nitride formation of the substrate surface in the initial stage of the deposition process. High temperatures above 350-degrees-C during or after deposition result in metal segregations from the bulk of the substrate to the interface and even into the coating. Our observations suggest that, by controlling the substrate temperature and deposition parameters, one can effectively control structural and chemical characteristics of the interface and the coating, and consequently increase the functional lifetimes of the composite system for a given application.

引用

页码：209 / 216

页数：8

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