A DOUBLE-RECESSED AL0.24GAAS/IN0.16 GAAS PSEUDOMORPHIC HEMT FOR KA-BAND AND Q-BAND POWER APPLICATIONS

被引:25
作者
HUANG, JC
SALEDAS, P
WENDLER, J
PLATZKER, A
BOULAIS, W
SHANFIELD, S
HOKE, W
LYMAN, P
AUCOIN, L
MIQUELARENA, A
BEDARD, C
ATWOOD, D
机构
[1] Research Division, Raytheon Company, Lexington
[2] Department of Oceanography, Massachusetts Institute of Technology
关键词
D O I
10.1109/55.244708
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A double-recessed 0.2-mum gate-length pseudomorphic HEMT (PHEMT) has been demonstrated with 500 mW of output power (833 mW/mm of gate periphery), 6-dB gain, and 35% power-added efficiency (PAE) at 32 GHz. At 44 GHz, the device exhibited 494 mW of output power (823 mW/mm), 4.3-dB gain, and 30% PAE. This level of performance is attributed to excellent MBE material, optimized epitaxial layer design, and the use of individual source vias and of double recess with tight channel dimensions. Excellent 3-inch wafer uniformity was also observed: dc yield was greater than 95% and the interquartile range for all dc parameters was less than 20% of the median value (most are significantly lower). To the best of our knowledge, the Ka-band result is a new state-of-the-art for power transistors.
引用
收藏
页码:456 / 458
页数:3
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