MAGNETIC-PROPERTIES OF NI-FE FILMS PREPARED BY A DC TRIODE SPUTTERING METHOD

被引：8

作者：

MINAKATA, R

机构：

[1] Sharp Corp, Tenri, Jpn, Sharp Corp, Tenri, Jpn

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1988年 / 24卷 / 03期

关键词：

MAGNETIC MATERIALS - Thin Films - SPUTTERING - Thin Films;

D O I：

10.1109/20.3394

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The magnetic properties Ni-Fe films with 81-wt% Ni prepared by a DC triode sputtering method are studied as functions of sputtering parameters. Two kinds of substrates are used: one is flat and the other is patterned. In the former case sufficiently low coercive forces are obtained when both the target voltage and the Ar pressure are kept below the critical values. In the latter case, a negative substrate bias voltage is necessary to improve the magnetic properties in addition to the previous conditions.

引用

页码：2020 / 2023

页数：4

共 7 条

[1] STRUCTURE-SENSITIVE MAGNETIC-PROPERTIES OF RF SPUTTERED NIFE FILMS [J].