LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .2. PLASMA CHARACTERISTICS AND ENERGY-TRANSPORT

被引：19

作者：

TISONE, TC ^{[1
]}

CRUZAN, PD ^{[1
]}

机构：

[1] BELL TEL LABS INC,ALLENTOWN,PA 18107

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 05期

关键词：

D O I：

10.1116/1.568462

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1058 / 1066

页数：9

共 16 条

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[4]

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[5]

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[6]

Langmuir I, 1924, GEN ELECTR REV, V27, P449, DOI DOI 10.1103/PHYSREV.28.727

[7]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[8] LOW-ENERGY ION-BOMBARDMENT EFFECTS IN SIO2 [J].

MCCAUGHAN, DV ;

MURPHY, VT .

[9]

Nasser E., 1971, FUNDAMENTALS GASEOUS

NEVIS, BE ;

TISONE, TC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06) :1177-1185