DIFFRACTIVE TECHNIQUES FOR LITHOGRAPHIC PROCESS MONITORING AND CONTROL

被引：14

作者：

NAQVI, SSH

ZAIDI, SH

BRUECK, SRJ

MCNEIL, JR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587479

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3600 / 3606

页数：7

共 64 条

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