OPTICAL MONITORING OF ETCHING IN INORGANIC RESISTS

[1] Born M., 1975, PRINCIPLES OPTICS, P62

[2] DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS [J]. OPTICS COMMUNICATIONS, 1978, 24 (02) : 220 - 224

[3] COLLIER RL, 1971, OPTICAL HOLOGRAPHY, P107

[4] FITZGIBBON ET, 1971, MAY EL SOC EXT ABST, P38

[5] FITZGIBBONS ET, 1970, AFSOR691972 NASA JSE

[6] LOCALIZED ELECTRON-STATES IN ARSENIC CHALCOGENIDES [J]. PHILOSOPHICAL MAGAZINE, 1976, 34 (03): : 331 - 335

[7] EFFECT OF KILOVOLT ELECTRONS ON ETCH RATE OF AL2O3 AND TA2O5 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (05) : 668 - &

[8] JANAI M, 1976, PHOTOGR SCI ENG, V20, P234

[9] FE2O3 - INORGANIC ELECTRON RESIST MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 929 - 932

[10] SURFACE RELIEF HOLOGRAMS IN EVAPORATED ARSENIC TRISULFIDE FILMS [J]. THIN SOLID FILMS, 1974, 21 (02) : 281 - 285

[1] Born M., 1975, PRINCIPLES OPTICS, P62

[2] DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS [J]. OPTICS COMMUNICATIONS, 1978, 24 (02) : 220 - 224

[3] COLLIER RL, 1971, OPTICAL HOLOGRAPHY, P107

[4] FITZGIBBON ET, 1971, MAY EL SOC EXT ABST, P38

[5] FITZGIBBONS ET, 1970, AFSOR691972 NASA JSE

[6] LOCALIZED ELECTRON-STATES IN ARSENIC CHALCOGENIDES [J]. PHILOSOPHICAL MAGAZINE, 1976, 34 (03): : 331 - 335

[7] EFFECT OF KILOVOLT ELECTRONS ON ETCH RATE OF AL2O3 AND TA2O5 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (05) : 668 - &

[8] JANAI M, 1976, PHOTOGR SCI ENG, V20, P234

[9] FE2O3 - INORGANIC ELECTRON RESIST MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 929 - 932

[10] SURFACE RELIEF HOLOGRAMS IN EVAPORATED ARSENIC TRISULFIDE FILMS [J]. THIN SOLID FILMS, 1974, 21 (02) : 281 - 285