MICROWAVE PLASMAS IN SURFACE-TREATMENT TECHNOLOGIES

被引:3
作者
DUSEK, V
MUSIL, J
机构
[1] Institute of Physics, Czechosl. Acad. Sci., Prague 8, 180 40
关键词
D O I
10.1007/BF01605048
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In this review, basic problems of generating microwave isotropic and anisotropic plasmas are summarized. A brief description of the fundamental types of microwave-plasma-based devices which are used in various surface treatment technologies are given. Their application potentialities and probable directions of future development are discussed. © 1990 Academia, Publishing House of the Czechoslovak Academy of Sciences.
引用
收藏
页码:1185 / 1204
页数:20
相关论文
共 77 条
[1]   PLASMA-ETCHING IN MAGNETIC MULTIPOLE MICROWAVE-DISCHARGE [J].
ARNAL, Y ;
PELLETIER, J ;
POMOT, C ;
PETIT, B ;
DURANDET, A .
APPLIED PHYSICS LETTERS, 1984, 45 (02) :132-134
[2]  
ARNAL Y, 1987, 6E COLL INT PLAS PUL, P73
[3]   CRYSTALLIZATION OF DIAMOND CRYSTALS AND FILMS BY MICROWAVE ASSISTED CVD .2. [J].
BADZIAN, AR ;
BADZIAN, T ;
ROY, R ;
MESSIER, R ;
SPEAR, KE .
MATERIALS RESEARCH BULLETIN, 1988, 23 (04) :531-548
[4]   SILICON-NITRIDE FILMS PREPARED BY PACVD OUTSIDE THE PLASMA [J].
BARDOS, L ;
MUSIL, J .
CZECHOSLOVAK JOURNAL OF PHYSICS, 1985, 35 (12) :1437-1444
[5]   NITROGEN ACTIVATION FOR PLASMA CHEMICAL SYNTHESIS OF THIN SI3N4 FILMS [J].
BARDOS, L ;
MUSIL, J ;
TARAS, P .
THIN SOLID FILMS, 1983, 102 (02) :107-110
[6]  
BARDOS L, 1983, CREATION THIN OXIDE
[7]  
BARDOS L, 1982, 1179 CZECH AC SCI I
[8]  
BERSIN RL, 1986, MICROELEC MANUFAC TE, V9, P18
[9]  
BURKE RR, 1988, SOLID STATE TECHNOL, V31, P67
[10]  
BURKE RR, 1987, P MAT RES SOC S A PH