SHAPE OF THE SURFACE-STEP-DENSITY OSCILLATIONS DURING SPUTTERING OF SINGULAR AND VICINAL SURFACES

被引:20
作者
SMILAUER, P
WILBY, MR
VVEDENSKY, DD
机构
[1] UNIV LONDON IMPERIAL COLL SCI TECHNOL & MED,BLACKETT LAB,DEPT PHYS,LONDON SW7 2BZ,ENGLAND
[2] UNIV LONDON UNIV COLL,DEPT ELECT & ELECTR ENGN,LONDON WC1E 7JE,ENGLAND
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 07期
关键词
D O I
10.1103/PhysRevB.48.4968
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The evolution of the morphology of sputtered surfaces has been investigated using computer simulations of a solid-on-solid model. We have studied the close analogy between growth and sputtering and found two phenomena which have not yet been observed experimentally: the asymmetric shape of the surface-step-density oscillations, and the delay of the first maximum in both the step density and the kinematic intensity oscillations during sputtering of vicinal surfaces. We have found that the asymmetric shape of the step density oscillations during sputtering is due to coalescence phenomena.
引用
收藏
页码:4968 / 4971
页数:4
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