PARAMETERS FOR INSITU GROWTH OF HIGH-TC SUPERCONDUCTING THIN-FILMS USING AN OXYGEN PLASMA SOURCE

被引：38

作者：

SPAH, RJ

HESS, HF

STORMER, HL

WHITE, AE

SHORT, KT

机构：

来源：

关键词：

D O I：

10.1063/1.100614

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：441 / 443

页数：3

共 9 条

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[9] LOW-TEMPERATURE PREPARATION OF HIGH-TC SUPERCONDUCTING THIN-FILMS
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