DECOMPOSITION OF FLUOROCARBON GASEOUS CONTAMINANTS BY SURFACE DISCHARGE-INDUCED PLASMA CHEMICAL-PROCESSING

被引:81
作者
ODA, T
TAKAHASHI, T
NAKANO, H
MASUDA, S
机构
[1] CHUBU ELECT POWER CO INC,ELECT POWER DISTRIBUT & CONTROL SECT,NAGOYA,JAPAN
[2] MASUDA RES INST,TOKYO,JAPAN
关键词
D O I
10.1109/28.231995
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The decomposition performance of surface discharge induced plasma chemical processing (SPCP) with a cylindrical ceramic-based reactor for chlorofluorocarbon gases was measured in atmospheric air, pure oxygen gas, or pure nitrogen gas. In the case of decomposition test for 1000 ppm CFC-22 in air, a maximum decomposition rate of about 90% was recorded. In the case of the decomposition test for 100 ppm CFC-113, more than 99%, fluorocarbon could be removed. The decomposition mechanism of fluorocarbon is not yet known exactly but is assumed to be due to the effect of the surface discharge plasma near the discharge electrode. The decomposition rate for fluorocarbon in nitrogen gas was the largest among three gases (air, nitrogen, and oxygen), indicating the strong activity of the nitrogen radicals. A large ceramic reactor was also tested, and the decomposition performance was found to be proportional to the real electric power consumption under best conditions. The reaction products after the SPCP are not yet identified, but phosgene and its derivatives have not yet been found.
引用
收藏
页码:787 / 792
页数:6
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