REAL-TIME DOUBLE-EXPOSURE INTERFEROMETRY WITH BI12SIO20 CRYSTALS IN TRANSVERSE ELECTROOPTIC CONFIGURATION

被引：99

作者：

HUIGNARD, JP ^{[1
]}

HERRIAU, JP ^{[1
]}

机构：

[1] THOMSON CSF,CENT RECH LAB,F-91401 ORSAY,FRANCE

来源：

APPLIED OPTICS | 1977年 / 16卷 / 07期

关键词：

D O I：

10.1364/AO.16.001807

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1807 / 1809

页数：3

共 9 条

[1]

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[2]

Collier R. J., 1971, OPTICAL HOLOGRAPHY, P280

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[4] SELECTIVE ERASURE AND PROCESSING IN VOLUME HOLOGRAMS SUPERIMPOSED IN PHOTOSENSITIVE FERROELECTRICS [J].

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HERRIAU, JP ;

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GAYLORD, TK .

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[7] HIGH-SENSITIVITY OPTICAL RECORDING IN KTN BY 2-PHOTON ABSORPTION [J].

VONDERLINDE, D ;

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RODGERS, KF .

APPLIED PHYSICS LETTERS, 1975, 26 (01) :22-24

[8]

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[9] THEORY OF FORMATION OF PHASE HOLOGRAMS IN LITHIUM-NIOBATE [J].

YOUNG, L ;

WONG, WKY ;

THEWALT, MLW ;

CORNISH, WD .

APPLIED PHYSICS LETTERS, 1974, 24 (06) :264-265

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