SELECTIVE ERASURE AND PROCESSING IN VOLUME HOLOGRAMS SUPERIMPOSED IN PHOTOSENSITIVE FERROELECTRICS

被引：26

作者：

HUIGNARD, JP ^{[1
]}

HERRIAU, JP ^{[1
]}

MICHERON, F ^{[1
]}

机构：

[1] THOMSON CSF,LCR,F-91401 ORSAY,FRANCE

来源：

FERROELECTRICS | 1976年 / 11卷 / 1-2期

关键词：

D O I：

10.1080/00150197608236587

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：393 / 396

页数：4

共 9 条

[1] HOLOGRAPHIC STORAGE IN LITHIUM NIOBATE [J].

CHEN, FS ;

LAMACCHIA, JT ;

FRASER, DB .

APPLIED PHYSICS LETTERS, 1968, 13 (07) :223-+

[2] EXPERIMENTAL HOLOGRAPHIC READ-WRITE MEMORY USING 3-D STORAGE [J].

DAURIA, L ;

HUIGNARD, JP ;

SLEZAK, C ;

SPITZ, E .

APPLIED OPTICS, 1974, 13 (04) :808-818

[3] HIGH-VOLTAGE BULK PHOTOVOLTAIC EFFECT AND THE PHOTOREFRACTIVE PROCESS IN LINBO3 [J].

GLASS, AM ;

LINDE, DVD ;

NEGRAN, TJ .

APPLIED PHYSICS LETTERS, 1974, 25 (04) :233-235

[4] COHERENT SELECTIVE ERASURE OF SUPERIMPOSED VOLUME HOLOGRAMS IN LINBO3 [J].

HUIGNARD, JP ;

HERRIAU, JP ;

MICHERON, F .

APPLIED PHYSICS LETTERS, 1975, 26 (05) :256-258

[5] WAVELENGTH DEPENDENCE OF PHOTOREFRACTIVE PROCESS IN DOPED LINBO3 [J].

KURZ, H .

FERROELECTRICS, 1974, 8 (1-2) :437-439

[6] CONTROL OF SUSCEPTIBILITY OF LITHIUM NIOBATE TO LASER-INDUCED REFRACTIVE INDEX CHANGES [J].

PETERSON, GE ;

GLASS, AM ;

NEGRAN, TJ .

APPLIED PHYSICS LETTERS, 1971, 19 (05) :130-&

[7]

PHILLIPS W, 1972, RCA REV, V33, P94

[8] MULTIPLE STORAGE AND ERASURE OF FIXED HOLOGRAMS IN FE-DOPED LINBO3 [J].

STAEBLER, DL ;

BURKE, WJ ;

PHILLIPS, W ;

AMODEI, JJ .

APPLIED PHYSICS LETTERS, 1975, 26 (04) :182-184

[9]

STAEBLER DL, 1974, APPL OPTICS, V13, P789

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