ANGULAR MEASUREMENTS WITH X-RAY INTERFEROMETRY

被引：12

作者：

WINDISCH, D

BECKER, P

机构：

[1] Physikalisch-Technische, Bundesanstalt, Braunschweig

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1992年 / 25卷

关键词：

D O I：

10.1107/S0021889891014231

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The angular dependence of the reflectivity in a skew-symmetric X-ray interferometer with the axis of rotation between two pairs of the reflecting wafers has been investigated experimentally and theoretically. Rapid oscillations with a periodicity of almost 0.002" have been observed. The period depends on the geometry and the lattice spacing of the interferometer. The amplitudes of the angular oscillations are strongly affected by Pendellosung interference phenomena. As an example of applications an optical autocollimator is calibrated by the X-ray interferometer.

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页码：377 / 383

页数：7

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