DEPOSITION OF CERAMICS BY LPVD

被引：2

作者：

FUNKEN, J ^{[1
]}

KREUTZ, EW ^{[1
]}

KROSCHE, M ^{[1
]}

SUNG, H ^{[1
]}

VOSS, A ^{[1
]}

ERKENS, G ^{[1
]}

LEMMER, O ^{[1
]}

LEYENDECKER, T ^{[1
]}

机构：

[1] CEMECOAT,W-5100 AACHEN,GERMANY

来源：

APPLIED SURFACE SCIENCE | 1992年 / 54卷

关键词：

D O I：

10.1016/0169-4332(92)90034-U

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The laser-assisted physical vapour deposition of ceramics is reported by photon-induced removal or vaporization of ceramic targets with subsequent deposition on stainless steel or hard metals. Different deposition conditions are achieved by variation of laser radiation parameters and processing variables especially variation of the flow characteristics and the composition of the processing gas to relate processing conditions to film dimensions as well as its resultant structural and mechanical properties. The structural properties of the deposited films are investigated by scanning electron microscopy and X-ray diffraction, the chemical ones by EDX spectroscopy. The films, which are highly compact without pores, are deduced to be amorphous and nearly stoichiometric with high adhesion strength.

引用

页码：141 / 146

页数：6

共 10 条

[1]

GASSER A, 1988, P SOC PHOTO-OPT INS, V1020, P70

[2] MICROSTRUCTURE OF VAPOR-DEPOSITED OPTICAL COATINGS [J].