EPITAXY OF NOBLE-METALS AND (111) SURFACE SUPERSTRUCTURES OF SILICON AND GERMANIUM .2. STUDY AFTER ANNEALING

被引：74

作者：

LELAY, G ^{[1
]}

QUENTEL, G ^{[1
]}

FAURIE, JP ^{[1
]}

MASSON, A ^{[1
]}

机构：

[1] CTR UNIV ST JEROME,LAB MECANISMES CROISSANCE CRISTALLINE,F-13397 MARSEILLE 4,FRANCE

来源：

THIN SOLID FILMS | 1976年 / 35卷 / 03期

关键词：

D O I：

10.1016/0040-6090(76)90196-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：289 / 303

页数：15

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