MULTILEVEL GRATING ARRAY ILLUMINATORS MANUFACTURED BY ELECTRON-BEAM LITHOGRAPHY

被引：22

作者：

EKBERG, M

LARSSON, M

HARD, S

TURUNEN, J

TAGHIZADEH, MR

WESTERHOLM, J

VASARA, A

机构：

[1] HERIOT WATT UNIV, DEPT PHYS, EDINBURGH EH14 4AS, MIDLOTHIAN, SCOTLAND

[2] HELSINKI UNIV TECHNOL, DEPT TECH PHYS, SF-02150 ESPOO, FINLAND

来源：

OPTICS COMMUNICATIONS | 1992年 / 88卷 / 01期

基金：

芬兰科学院;

关键词：

D O I：

10.1016/0030-4018(92)90305-B

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Two-dimensional multilevel grating array generators with regular M x N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2 x 2, 4 x 4, 1 x 8, and 8 x 8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are approximately 10% above the theoretical efficiencies of non-separable binary-phase array illuminators.

引用

页码：37 / 41

页数：5

共 13 条

[1] DIGITAL HOLOGRAPHY - COMPUTER-GENERATED HOLOGRAMS [J].