共 5 条
[2]
CrN films deposited by rf reactive sputtering using a plasma emission monitoring control[J] . Shozo Inoue,Futami Okada,Keiji Koterazawa.Vacuum . 2002 (3)
[4]
C -axis orientation of AlN films prepared by ECR PECVD[J] . Ju-Won Soh,Seong-Soo Jang,In-Seop Jeong,Won-Jong Lee.Thin Solid Films . 1996 (1)
[5]
METH.[P]. TAKAHASHI HIDEYUKI[JP];TAKEDA GENTARO;TAKEDA YUKI.MX2023012230A,2023-10-30