Plasma spraying of porous nanostructured TiO2 film

被引：24

作者：

Zhu, YC ^{[1
]}

Ding, CX ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China

来源：

NANOSTRUCTURED MATERIALS | 1999年 / 11卷 / 03期

关键词：

D O I：

10.1016/S0965-9773(99)00047-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Porous nanostructured TiO2 Films were deposited by vacuum plasma spraying process using nano-TiO2 particles as spray powders. The crystal structure of the films were determined with XRD. The morphology and size distribution of TiO2 particles of the films were characterized by SEM and TEM. It was found that TiO2 films were a mixture of anatase rutile and TiO2-x phases, and their contents were dependent on plasma parameters. The TiO2 particle size of the films ranged from several to 100nm. (C) 1999 Acta Metallurgica Inc.

引用

页码：319 / 323

页数：5

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