Annealing of ion beam amorphized diamond surfaces studied by in situ electron spectroscopy

被引：20

作者：

Hoffman, A ^{[1
]}

Bobrov, K ^{[1
]}

Fisgeer, B ^{[1
]}

Shechter, H ^{[1
]}

Folman, M ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,IL-32000 HAIFA,ISRAEL

来源：

关键词：

natural diamond; ion bombardment; electron spectroscopy; annealing;

D O I：

10.1016/0925-9635(96)80008-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In the present work the effect of annealing an amorphized diamond (100) surface by 0.5 keV Ar irradiation was investigated in situ using electron spectroscopy. The recovery of the damaged layer to an sp(2), graphitic-like, carbon network structure was traced by the effect of heat treatment in the range 300-1200 K on the C(KLL) lint shape, electron energy loss (EEL) and secondary electron emission (SEE) spectra. The analysis suggests that the graphitization of the damaged layer is a thermally activated process. From a quantitative analysis of the EEL spectra measured as a function of annealing time at 600 K, the graphitization process of the damaged layer was Found to Follow a first-order kinetic process with activation energy of approximately 178 kJ mol(-1).

引用

页码：76 / 82

页数：7

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