Thin ZnS:Cu,Ga and ZnO:Cu,Ga film phosphors

被引:34
作者
Kryshtab, TG
Khomchenko, VS
Papusha, VP
Mazin, MO
Tzyrkunov, YA
机构
[1] UPALM, ESFM Inst Polytech Natl, Dept Mat Sci, Mexico City 07738, DF, Mexico
[2] NAS Ukraine, ISP, UA-03028 Kiev, Ukraine
[3] ISP, Special Technol & Design Off, Kiev, Ukraine
关键词
EBE; ZnS : Cu; ZnO : Cu; XRD; AFM; luminescence;
D O I
10.1016/S0040-6090(01)01535-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new technique for electro- and cathodoluminescent screen fabrication with the application of a new method of doping ZnS:Cu and ZnO:Cu thin film phosphors is proposed. Thin films of ZnS:Cu were grown by electron-beam evaporation (EBE) from a ZnS:Cu target on substrates heated to 150-200degreesC, and the Cu concentration in the target was varied from 0.06 to 0.25 wt.%. BaTiO3 and sapphire single crystal substrates were used. The film thickness varied from 0.6 to 9 mum. Parameters of ZnS:Cu films grown by EBE were modified by the use of non-vacuum annealing at 700-1000degreesC in S-rich or O-2-rich atmosphere both with and without Ga co-doping. The measurement of electroluminescent (EL) and cathodoluminescent (CL) parameters, as well as X-ray diffraction (XRD) techniques and atomic force microscopy (AFM) were used for this research. The EL ZnS:Cu,Ga blue color emission film with a luminance of 30 cd/m(2) and green (yellow) color emission film with a luminance of 900 cd/m(2) were obtained. Devices with such films have a threshold voltage of 10 V. The CL luminance was 200 cd/m2 for ZnS:Cu,Ga and 1100 cd/m(2) for ZnO:Cu.Ga films at 300 K and 3700 cd/m(2) for ZnO:Cu.Ga films at 77 K. The films show a deeper green color than commercial phosphors. Clarification that gallium co-doping affects the luminance, since Ga influences on recrystallization process, has been carried out. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:76 / 80
页数:5
相关论文
共 9 条
[1]   STRUCTURAL STUDY OF ZNS THIN-FILMS PREPARED BY SPRAY-PYROLYSIS [J].
AFIFI, HH ;
MAHMOUD, SA ;
ASHOUR, A .
THIN SOLID FILMS, 1995, 263 (02) :248-251
[2]  
GORBIK PP, 2001, REP NATION ACAD SCI, V1, P84
[3]   AFM studies on ZnS thin films grown by atomic layer epitaxy [J].
Ihanus, J ;
Ritala, M ;
Leskela, M ;
Prohaska, T ;
Resch, R ;
Friedbacher, G ;
Grasserbauer, M .
APPLIED SURFACE SCIENCE, 1997, 120 (1-2) :43-50
[4]  
JEON BS, 1998, P 4 INT C SCI TECHN, P410
[5]  
Khomchenko VS, 1998, P 7 INT S ADV DISPL, P218
[6]   MOLECULAR-BEAM EPITAXIAL ZNSE-MN DC ELECTROLUMINESCENT CELL WITH VERY LOW THRESHOLD VOLTAGE [J].
MISHIMA, T ;
WANG, QK ;
TAKAHASHI, K .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5797-5799
[7]  
Ohnishi H., 1987, 1987 SID International Symposium. Digest of Technical Papers. First Edition, P238
[8]  
RODIONOV VE, 1997, Patent No. 1288
[9]  
WALG Q, 1996, U NUTR SCI ED, V32, P410