Observation of specific intermolecular interactions in the X-ray crystal structure of Cu(I) (1,1,1,3,5,5,5-hepta-fluoropentane-2,4-dionato) (vinyltrimethylsilane)

被引:14
作者
Chen, TY
Omnès, L
Vaisserman, J
Doppelt, P
机构
[1] ESPCI, Ctr Etudes Chim Met, CNRS, UPR 2801, F-75231 Paris 05, France
[2] Univ Paris 06, Lab Chim Inorgan & Mat Mol, CNRS 7071, F-75252 Paris 05, France
关键词
CuCVD; precursor; intermolecular interaction;
D O I
10.1016/j.ica.2003.10.022
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
The determination of the X-ray crystal structure of Cu-(1) (1,1,1,3,5,5,5-heptafluoro-pentane-2,4-dionato) (vinyltrimethylsilane) or Cu(pfac)(VTMS), a close analogue to Cu(hfaC)(VTMS), which is the most widely used precursor for copper CVD, gives us an unique insight about the molecular structure of such compounds. In particular, two short F...H distances between CF3 groups of a molecule and the alkenyl hydrogen atoms of the neighboring molecule reveal intermolecular interactions specifically related to the structure of the VTMS ligand. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:1299 / 1302
页数:4
相关论文
共 16 条
[1]   2-methyl-1-hexen-3-yne Lewis base stabilized, β-diketonate copper(I) complexes:: X-ray structures, theoretical study, and low-temperature chemical vapor deposition of copper metal [J].
Chen, TY ;
Vaissermann, J ;
Ruiz, E ;
Sénateur, JP ;
Doppelt, P .
CHEMISTRY OF MATERIALS, 2001, 13 (11) :3993-4004
[2]   THE CHEMISTRY OF BETA-DIKETONATE COPPER(I) COMPOUNDS .3. THE SYNTHESIS OF (BETA-DIKETONATE) CU(1,5-COD) COMPOUNDS, THE SOLID-STATE STRUCTURE AND DISPROPORTIONATION OF HEXAFLUOROACETYLACETONATO (1,5-CYCLOOCTADIENE)COPPER(I), (HFAC)CU(1,5-COD) [J].
CHI, KM ;
SHIN, HK ;
HAMPDENSMITH, MJ ;
DUESLER, EN ;
KODAS, TT .
POLYHEDRON, 1991, 10 (19) :2293-2299
[3]   SYNTHESIS AND CHARACTERIZATION OF (BETA-DIKETONATE)(7-TERT-BUTOXYNORBORNADIENE)COPPER(I) COMPOUNDS, A SERIES OF NEW COPPER CVD PRECURSORS [J].
CHI, KM ;
HOU, HC ;
HUNG, PT ;
PENG, SM ;
LEE, GH .
ORGANOMETALLICS, 1995, 14 (06) :2641-2648
[4]   EXCITED-STATES OF MIXED-LIGAND CHELATES OF RUTHENIUM(II) AND RHODIUM(III) [J].
CROSBY, GA ;
ELFRING, WH .
JOURNAL OF PHYSICAL CHEMISTRY, 1976, 80 (20) :2206-2211
[5]   CHEMICAL-VAPOR-DEPOSITION OF COPPER FOR IC METALLIZATION - PRECURSOR CHEMISTRY AND MOLECULAR-STRUCTURE [J].
DOPPELT, P ;
BAUM, TH .
MRS BULLETIN, 1994, 19 (08) :41-48
[6]   MECHANISTIC STUDIES OF COPPER THIN-FILM GROWTH FROM CU(I) AND CU(II) BETA-DIKETONATES [J].
GIROLAMI, GS ;
JEFFRIES, PM ;
DUBOIS, LH .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1993, 115 (03) :1015-1024
[7]   Evaluation of (hfac)Cu(MHY) for CuCVD [J].
Joulaud, M ;
Angekort, C ;
Doppelt, P ;
Mourier, T ;
Mayer, D .
MICROELECTRONIC ENGINEERING, 2002, 64 (1-4) :107-115
[8]  
Kodas T.T., 1994, The Chemistry of Metal CVD
[9]   BOND BREAKING IN THE CHEMICAL-VAPOR-DEPOSITION PRECURSOR (1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONATO)(ETA-2-1,5-CYCLOOCTADIENE)-COPPER(I) STUDIED BY VARIABLE-TEMPERATURE X-RAY CRYSTALLOGRAPHY AND SOLID-STATE NMR-SPECTROSCOPY [J].
KUMAR, R ;
FRONCZEK, FR ;
MAVERICK, AW ;
KIM, AJ ;
BUTLER, LG .
CHEMISTRY OF MATERIALS, 1994, 6 (05) :587-595
[10]   COPPER(I) PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER METAL [J].
KUMAR, R ;
FRONCZEK, FR ;
MAVERICK, AW ;
LAI, WG ;
GRIFFIN, GL .
CHEMISTRY OF MATERIALS, 1992, 4 (03) :577-582