Treatment Of CCl4 and CHCl3 emission in a gliding-arc plasma

被引：21

作者：

Indarto, A ^{[1
]}

Choi, JW ^{[1
]}

Lee, H ^{[1
]}

Song, HK ^{[1
]}

机构：

[1] Korea Inst Sci & Technol, Clean Technol Res Ctr, Seoul 130650, South Korea

来源：

PLASMA DEVICES AND OPERATIONS | 2006年 / 14卷 / 01期

关键词：

plasma; gliding arc; CCl4; CHCl3; decomposition reaction;

D O I：

10.1080/10519990500493833

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

The decomposition of the chlorinated hydrocarbons CCl4 and CHCl3 in a gliding-are plasma was examined. The effects of initial concentrations, total gas flow rates and power consumption were investigated. The conversion of the hydrocarbons mentioned above was relatively high. It could reach 80% for CCl4 and 97% for CHCl3.. In atmospheric air as a carrier gas, the reaction was exothermic, and the main products were CO2, CO and Cl-2. The transformation into CCl4 was also detected for the decomposition reaction of CHCl3. The conversion of these compounds increased with increasing frequency of power supplied and decreasing total gas flow rate.

引用

页码：1 / 14

页数：14

共 21 条

[1] Photocatalytic destruction of VOCs in the gas-phase using titanium dioxide [J].

Alberici, RM ;

Jardim, WE .

APPLIED CATALYSIS B-ENVIRONMENTAL, 1997, 14 (1-2) :55-68

[2] DETAILED CHEMICAL KINETIC MODELING OF FUEL-RICH C2HCL3/O2/AR FLAMES [J].

CHANG, WD ;

SENKAN, SM .

ENVIRONMENTAL SCIENCE & TECHNOLOGY, 1989, 23 (04) :442-450

[3] Kinetics and mechanisms of UV-photodegradation of chlorinated organics in the gas phase [J].

Chen, FY ;

Pehkonen, SO ;

Ray, MB .

WATER RESEARCH, 2002, 36 (17) :4203-4214

[4]

COBINE JD, 1958, GASEOUS CONDUCTOR TH, P160

[5] GLIDING ARC - APPLICATIONS TO ENGINEERING AND ENVIRONMENT CONTROL [J].

CZERNICHOWSKI, A .

PURE AND APPLIED CHEMISTRY, 1994, 66 (06) :1301-1310

[6]

*IARC, 1987, IARC MON S, V7

[7]

KIRKOTHMER, 1978, ENCY CHEM TECHNOLOGY, V5, P668

[8] ELECTRON-BEAM ATMOSPHERIC-PRESSURE COLD-PLASMA DECOMPOSITION OF CARBON-TETRACHLORIDE AND TRICHLOROETHYLENE [J].

KOCH, M ;

COHN, DR ;

PATRICK, RM ;

SCHUETZE, MP ;

BROMBERG, L ;

REILLY, D ;

HADIDI, K ;

THOMAS, P ;

FALKOS, P .

ENVIRONMENTAL SCIENCE & TECHNOLOGY, 1995, 29 (12) :2946-2952

[9] Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor [J].

Kohno, H ;

Berezin, AA ;

Chang, JS ;

Tamura, M ;

Yamamoto, T ;

Shibuya, A ;

Hondo, S .

IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 1998, 34 (05) :953-966

[10] Phosgene formation from the decomposition of 1,1-C2H2Cl2 contained gas in an RF plasma reactor [J].

Lee, WJ ;

Chen, CY ;

Lin, WC ;

Wang, YT ;

Chin, CJ .

JOURNAL OF HAZARDOUS MATERIALS, 1996, 48 (1-3) :51-67

← 1 2 3 →