Selective adsorption of metallocenes on clean and chemically modified Si(111) surfaces

被引：8

作者：

Lin, JL

Rauscher, H

Kirakosian, A

Himpsel, FJ

Dowben, PA

机构：

[1] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA

[2] Univ Nebraska, Lincoln, NE USA

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 86卷 / 10期

关键词：

D O I：

10.1063/1.371551

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Metallocene adsorption on clean Si(111) and CaF2/CaF1/Si(111) substrates has been investigated with scanning tunneling microscopy. The surface chemical composition is found to strongly change the adsorption site selectivity, leading to an enhanced edge selectivity on modified substrates. Templates with well-defined local chemical reactivity have been created via self-assembly. The selective adsorption of metallocenes on such tailored substrates facilitates patterning ordered arrays of magnetic nanowires and stripes on the single digit nanometer scale. (C) 1999 American Institute of Physics. [S0021-8979(99)01822-8].

引用

页码：5492 / 5496

页数：5

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