WAVELENGTH CONTROL OF IRON-NICKEL COMPOSITION IN LASER-INDUCED CHEMICAL VAPOR-DEPOSITED FILMS

被引：16

作者：

ARMSTRONG, JV ^{[1
]}

BURK, AA ^{[1
]}

COEY, JMD ^{[1
]}

MOORJANI, K ^{[1
]}

机构：

[1] JOHNS HOPKINS UNIV, APPL PHYS LAB, LAUREL, MD 20707 USA

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 18期

关键词：

D O I：

10.1063/1.97918

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1231 / 1233

页数：3

共 15 条

[1] ELECTRONIC ABSORPTION SPECTRUM OF FERROCENE
ARMSTRON.AT
SMITH, F
ELDER, E
MCGLYNN, SP
[J]. JOURNAL OF CHEMICAL PHYSICS, 1967, 46 (11) : 4321 - &
[2] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2
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COLLINS, GJ
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (08) : 716 - 719
[3] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES
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OSGOOD, RM
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177
[4] EXCIMER LASER-INDUCED DEPOSITION OF INP AND INDIUM-OXIDE FILMS
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[J]. APPLIED PHYSICS LETTERS, 1984, 44 (10) : 951 - 953
[5] EXCIMER LASER-INDUCED DEPOSITION OF INP - CRYSTALLOGRAPHIC AND MECHANISTIC STUDIES
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GEVA, M
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2022 - 2035
[6] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF III-V-SEMICONDUCTORS
DUPUIS, RD
[J]. SCIENCE, 1984, 226 (4675) : 623 - 629
[7] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS
EHRLICH, DJ
OSGOOD, RM
DEUTSCH, TF
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) : 1233 - 1243
[8] THE VAPOR-PHASE ULTRAVIOLET-SPECTRA OF METALLO-ORGANIC PRECURSORS TO III-V-COMPOUNDS
HAIGH, J
[J]. JOURNAL OF MATERIALS SCIENCE, 1983, 18 (04) : 1072 - 1076
[9] LASER-INDUCED VAPOR-DEPOSITION OF SILICON
HANABUSA, M
NAMIKI, A
YOSHIHARA, K
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627
[10] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF CARBON
LEYENDECKER, G
BAUERLE, D
GEITTNER, P
LYDTIN, H
[J]. APPLIED PHYSICS LETTERS, 1981, 39 (11) : 921 - 923

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