Structure and stress-induced alignment of a hydrogen-carbon complex in silicon

被引:24
作者
Kamiura, Y
Ishiga, N
Yamashita, Y
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 11A期
关键词
defect; hydrogen; carbon; Si; stress-induced alignment; DLTS;
D O I
10.1143/JJAP.36.L1419
中图分类号
O59 [应用物理学];
学科分类号
摘要
We applied deep-level transient spectroscopy (DLTS) under uniaxial stress to study the structure and bonding nature of a hydrogen-carbon (H-C) complex in Si. The application of [111] and [110] compressive stresses split the DLTS peak into two as ratios of 1:3 and 2:2, respectively, which were the ratios of the low-temperature peak to the high-temperature peak. No splitting was observed under the [100] stress. These results indicate the trigonal symmetry of the H-C complex and the anti-bonding nature of its electronic state. We observed a stress-induced alignment of the complex at 250K for 50 min under a [110] stress of 1 GPa.
引用
收藏
页码:L1419 / L1421
页数:3
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