Near-field optical imaging the surface plasmon fields of lithographically designed nanostructures

被引：51

作者：

Krenn, JR ^{[1
]}

Wolf, R ^{[1
]}

Leitner, A ^{[1
]}

Aussenegg, FR ^{[1
]}

机构：

[1] ERWIN SCHRODINGER INST NANOSTRUKTURFORSCH,A-8010 GRAZ,AUSTRIA

来源：

OPTICS COMMUNICATIONS | 1997年 / 137卷 / 1-3期

关键词：

near-field optical microscopy; surface plasmons; nanooptics; nanodesign;

D O I：

10.1016/S0030-4018(96)00710-9

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A near-field optical microscope has been used for probing the surface plasmon fields on a smooth silver film with superimposed specifically designed nanoscale surface structures, These structures can be tailored by means of electron-beam lithography. Interference patterns resulting from scattering of surface plasmons have been observed, together with enhanced near-field intensities localized to subwavelength areas. The spatial profile of the surface plasmon enhanced near-field can be changed by adjusting the design parameters of the surface structures.

引用

页码：46 / 50

页数：5

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