Nitrogenated amorphous carbon films synthesized by electron cyclotron resonance plasma enhanced chemical vapor deposition

被引：11

作者：

Chan, WC ^{[1
]}

Fung, MK ^{[1
]}

Bello, I ^{[1
]}

Lee, CS ^{[1
]}

Lee, ST ^{[1
]}

机构：

[1] City Univ Hong Kong, Dept Phys & Mat Sci, Ctr Super Diamond & Adv Films, Kowloon, Peoples R China

来源：

关键词：

nitrogenated amorphous carbon; plasma-enhanced chemical vapor deposition;

D O I：

10.1016/S0925-9635(99)00017-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nitrogenated amorphous carbon (a-CNx:H) films were investigated as protective overcoats for industrial applications. Thin a-CNx:H films have been deposited on silicon by electron cyclotron resonance plasma-enhanced chemical vapor deposition. The substrate bias was found to play an important role in determining the chemical compositions and mechanical properties of the films. The surface roughness and hardness of the films can reach 1.4 Angstrom and 20 GPa, respectively. The influence of mechanical properties by hydrogen was studied. A correlation exists between the background slope of Raman spectra and the hydrogen content as determined by elastic recoil detection analysis. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：1732 / 1736

页数：5

共 20 条

[1] PHYSICAL-PROPERTIES OF THIN CARBON NITRIDE FILMS DEPOSITED BY ELECTRON-CYCLOTRON-RESONANCE ASSISTED VAPOR-DEPOSITION [J].

BOUSETTA, A ;

LU, M ;

BENSAOULA, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1995, 13 (03) :1639-1643

[2] Synthesis, composition, surface roughness and mechanical properties of thin nitrogenated carbon films [J].

Chan, WC ;

Zhou, BZ ;

Chung, YW ;

Lee, CS ;

Lee, ST .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (03) :1907-1911

[3]

DAVIS LE, 1978, HDB AUGER ELECT SPEC

[4] AMORPHOUS NITROGENATED CARBON-FILMS - STRUCTURAL MODIFICATIONS INDUCED BY THERMAL ANNEALING [J].

FREIRE, FL ;

ACHETE, CA ;

MARIOTTO, G ;

CANTERI, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (06) :3048-3053

[5] AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS OBTAINED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].

FREIRE, FL ;

MARIOTTO, G ;

ACHETE, CA ;

FRANCESCHINI, DF .

SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3) :382-386

[6]

FREIRE FL, 1997, THIN SOLID FILMS, V236, P243

[7]

HOFSASS HC, 1995, MATER RES SOC S P, V345, P696

[8] NANO-INDENTATION STUDIES OF ULTRAHIGH STRENGTH CARBON NITRIDE THIN-FILMS [J].

LI, D ;

CHUNG, YW ;

WONG, MS ;

SPROUL, WD .

JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) :219-223

[9]

LI D, 1995, DIAMOND FILM TECHNOL, V5, P261

[10] Mechanical properties of amorphous carbon nitride thin films prepared by reactive magnetron sputter-deposition [J].

Li, Dong ;

Chung, Yip-Wah ;

Wong, Ming-Show ;

Sproul, William D. .

TRIBOLOGY LETTERS, 1995, 1 (01) :87-93

← 1 2 →