Inclusion of nanosized silicon grains in hydrogenated protocrystalline silicon multilayers and its relation to stability

被引:27
作者
Myong, SY
Kwon, SW
Lim, KS
Kondo, M
Konagai, M
机构
[1] Korea Adv Inst Sci & Technol, Dept Elect Engn & Comp Sci, Taejon 305701, South Korea
[2] AIST, Tsukuba, Ibaraki 3058568, Japan
[3] TIT, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
关键词
D O I
10.1063/1.2179130
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence and Fourier transform infrared spectroscopy measured at room temperature produce strong evidence that nanosized silicon (nc-Si) grains embedded in hydrogenated protocrystalline silicon (i-pc-Si:H) multilayers. Thus, we propose the structure of the i-pc-Si:H multilayer possessing isolated nc-Si grains and their wrapping layers with a high hydrogen concentration embedded in highly hydrogen-diluted sublayers. The isolated nc-Si grains may act as radiative recombination centers of photoexcited carriers, and hence suppress the photocreation of dangling bonds caused by the nonradiative recombination in amorphous silicon matrix. Because of the repeatedly layered structure, the i-pc-Si:H multilayers have a fast light-induced metastability with a low degradation. (c) 2006 American Institute of Physics.
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相关论文
共 24 条
[1]   Stable protocrystalline silicon and unstable microcrystalline silicon at the onset of a microcrystalline regime [J].
Ahn, JY ;
Jun, KH ;
Lim, KS ;
Konagai, M .
APPLIED PHYSICS LETTERS, 2003, 82 (11) :1718-1720
[2]   Optical, structural and electrical properties of μc-Si:H films deposited by SiH4+H2 [J].
Ambrosone, G ;
Coscia, U ;
Lettieri, S ;
Maddalena, P ;
Minarini, C .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 101 (1-3) :236-241
[3]   Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization [J].
Grill, A ;
Neumayer, DA .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (10) :6697-6707
[4]   Hydrogen structures and the optoelectronic properties in transition films from amorphous to microcrystalline silicon prepared by hot-wire chemical vapor deposition [J].
Han, DX ;
Wang, KD ;
Owens, JM ;
Gedvilas, L ;
Nelson, B ;
Habuchi, H ;
Tanaka, M .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (07) :3776-3783
[5]  
Ito M., 2004, 14 INT PHOT SCI ENG, P381
[6]   Characterization and role of hydrogen in nc-Si:H [J].
Itoh, T ;
Yamamoto, K ;
Ushikoshi, K ;
Nonomura, S ;
Nitta, S .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 :201-205
[7]   Low degradation and fast annealing effects of amorphous silicon multilayer processed through alternate hydrogen dilution [J].
Jun, KH ;
Ouwens, JD ;
Schropp, REI ;
Lee, JY ;
Choi, JH ;
Lee, HS ;
Lim, KS .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (08) :4881-4888
[8]   Effects of embedded crystallites in amorphous silicon on light-induced defect creation [J].
Kamei, T ;
Stradins, P ;
Matsuda, A .
APPLIED PHYSICS LETTERS, 1999, 74 (12) :1707-1709
[9]   Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilution [J].
Kroll, U ;
Meier, J ;
Shah, A ;
Mikhailov, S ;
Weber, J .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (09) :4971-4975
[10]  
KWON SW, 2001, P 17 EUR PHOT SOL EN, P3015