Preparation of transparent conductive RuO2 thin film from its precursor solution

被引:5
作者
Hara, Y
Rengakuji, S
Nakamura, Y
Shinagawa, A
机构
[1] Toyama Univ, Fac Engn, Dept Syst Engn Mat & Life Sci, Toyama 9308555, Japan
[2] Toyama Univ, Ctr Instrumental Anal, Toyama 9308555, Japan
关键词
RuO2 precursor solution; RuO2 thin film; transparent conductive film;
D O I
10.5796/electrochemistry.70.13
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
It has been reported that RuO2 has a conductive nature like common metals despite its metal oxide character and has widely been used as a coating material for electric resistors etc. However, so far no report concerning the preparation of a transparent film has been found in the literature. We continued the efforts to prepare a transparent RuO2 film and developed a new method different from the conventional sol-gel method by preparing the precursor in a n-butanol-benzene system. To analyze the process of crystallization, the thermal behavior of RuO2, gel formed initially and the gases evolved during heat-treatment of the gel were investigated by TG-DTA-MS. The structure of the thin films after heat-treatment at 100, 250, and 450degreesC was measured by the X-ray diffraction method. n-Butanol and water were observed to evolve at a temperature range of 100-180degreesC beyond their boiling points. Transformation from the gel phase to the crystalline phase occurred at a temperature range of 100-250degreesC without any observation of the heat of crystallization upon DTA analysis. These results suggest the formation of an ordered gel network structure, which seems to arise from arrangement by the interaction among RuO2, precursors having both butoxy (hydrophobic) and hydroxy (hydrophilic) groups. Furthermore, it was presumed that the RuO2 gel crystallizes through the dehydration and dealcoholization reactions among these RuO2 precursors. The RuO2 thin films with thicknesses of 7.0 and 23.8 nm after heat-treatment at 450degreesC have transmittances of 59.6-75.8%, 36.2-59.0% in the wavelength range 380-780 nm, and electrical resistivities of 9.60 X 10(-4) and 4.15 x 10(-4) Omegacm, respectively. These thin films showed sufficient adhesion to a glass substrate.
引用
收藏
页码:13 / 17
页数:5
相关论文
共 18 条
[1]  
ADACHI K, 1996, Patent No. 8143337
[2]   A Ru(II) η3-allylic complex as a novel precursor for the CVD of Ru- and RuO2-nanostructured thin films [J].
Barreca, D ;
Buchberger, A ;
Daolio, S ;
Depero, LE ;
Fabrizio, M ;
Morandini, F ;
Rizzi, GA ;
Sangaletti, L ;
Tondello, E .
LANGMUIR, 1999, 15 (13) :4537-4543
[3]   COMPOSITIONAL AND MICROSTRUCTURAL CHARACTERIZATION OF RUO2-TIO2 CATALYSTS SYNTHESIZED BY THE SOL-GEL METHOD [J].
GUGLIELMI, M ;
COLOMBO, P ;
RIGATO, V ;
BATTAGLIN, G ;
BOSCOLOBOSCOLETTO, A ;
DEBATTISTI, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (06) :1655-1661
[4]   STUDIES ON OXIDE-COATED METAL ANODES FOR CHLOR-ALKALI CELLS [J].
HINE, F ;
YASUDA, M ;
YOSHIDA, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (04) :500-505
[5]   ELECTROORGANIC REACTIONS ON ORGANIC ELECTRODES .9. PRODUCT-SELECTIVITY CONTROL IN ELECTROREDUCTION OF AROMATIC CARBONYL-COMPOUNDS USING ELECTRODES COATED WITH LB-FILMS OF A QUATERNARY AMMONIUM SALT [J].
KUNUGI, Y ;
FUCHIGAMI, T ;
TIEN, HJ ;
NONAKA, T .
CHEMISTRY LETTERS, 1989, (05) :757-760
[6]   Thin film supercapacitors using a sputtered RuO2 electrode [J].
Lim, JH ;
Choi, DJ ;
Kim, HK ;
Cho, WI ;
Yoon, YS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (03) :A275-A278
[7]   PREPARATION AND PROPERTIES OF RU AND RUO2 THIN-FILM ELECTRODES FOR FERROELECTRIC THIN-FILMS [J].
MAIWA, H ;
ICHINOSE, N ;
OKAZAKI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (9B) :5223-5226
[8]  
MONDIO G, 1987, J APPL PHYS, V22, P1730
[9]   PREPARATION OF ULTRAFINE RUO2 AND IRO2 PARTICLES BY A SOL-GEL PROCESS [J].
MURAKAMI, Y ;
TSUCHIYA, S ;
YAHIKOZAWA, K ;
TAKASU, Y .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1994, 13 (24) :1773-1774
[10]   Preparation of ultrafine ruthenium oxide particles with ammonium hydrogencarbonate [J].
Murakami, Y ;
Ichikawa, S ;
Takasu, Y .
DENKI KAGAKU, 1997, 65 (12) :992-996