Microstructure and properties of CVD γ-Al2O3 coatings

被引：32

作者：

Larsson, A ^{[1
]}

Ruppi, S

机构：

[1] Chalmers Univ Technol, SE-41296 Gothenburg, Sweden

[2] Seco Tools AB, Res & Dev, SE-73782 Fagersta, Sweden

来源：

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2001年 / 19卷 / 4-6期

关键词：

chemical vapour deposition; alumina; TEM; EELS; XRD;

D O I：

10.1016/S0263-4368(01)00016-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This work deals with the microstructures and wear properties of chemical vapour deposited gamma-Al2O3. The gamma-Al2O3 coatings were deposited at 800 degreesC on TiN and Ti(C,N) pre-coated cemented carbide substrates. The microstructures developed in the gamma-Al2O3 coatings and the influence of the nucleation surface on the growth of gamma-Al2O3 were characterised using transmission electron microscopy, electron energy-loss spectroscopy and X-ray diffraction. The gamma-Al2O3 coatings were fine-grained with a high density of {111} growth twins and contained some residual sulphur. gamma-Al2O3 was found to grow epitaxially on the investigated substrates. The mechanical properties were evaluated in metal cutting and were compared with those of kappa-Al2O3 coated tools. As compared with the kappa-Al2O3 coatings, the gamma-Al2O3 coatings exhibited slightly worse adhesion and tendency for edge chipping. However, the gamma-Al2O3 coatings showed better crater wear resistance on the rake face than kappa-Al2O3 coatings. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：515 / 522

页数：8

共 30 条

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